What's New Research & Study Equipments         PLD system with Nd:YAG Laser for Thinfilm Growth Max. Laser Intensity : ~2J/㎠ Max. Substrate Temp. : 790℃ Base Pressure : 10μtorr Available Gases : Oxygen, Nitrogen Furnace Sets for Sample Growth for Crystal growth and Sample annealing Flux, Solid reaction sinterring Max. Temp : 1400℃ Temperature controller : K-type, Auto Available Condition : O₂, N₂, H₂/N₂mixed Tilted Furnace for Sample Growth for Crystal growth and Sample annealing Flux, Vapor, Solid reaction sinterring Max. Temp : 1400℃ Temperature controller : K-type, Auto Available Condition : O₂, N₂, H₂/N₂mixed Tiled Angle : 0 ~ 90 degree Hydrothermal system for Nanoparticle for Nanoparcles synthesis Components :    Hydrothermal oven(Max. Temp : 200℃)    Ultrasonic, Distilled machine make a particle using ultrasonic and Hydrothermal Sealing system for Vapor Transport and Evacuated quartz tube Available Condition : Vacuum, Ar, Cl make a anearobic and volatile sample Physical Properties Measurement System for measure Resistivity, Magnetic susceptivility, Heat capacity, Dielectric Constant, Polarization, Pyroelectric Magnetic field range : -9T ~ 9T Temperature range : -2K ~ 400K Option : Resistivity, VSM, Cryopump Electrical Transport Measurement System for measure Resistivity, Dielectric Constant, Polarization, Pyroelectric, Striction Magnetic field range : -1T ~ 1T Temperature range : -10K ~ 310K (Displaxor) RT~900℃(not magnetic field, Hightemp Furnace) Prove station for measure Resistivity, Dielectric Constant, Polarization to Thinfilm Components : Hot chuck, CCD, Station, Prove Temperature range : RT ~ 300℃ Glove Box for sample synthesis in anaerobic condition Components :    Main Box, Pass box, Dry trap,    Balance, Rotary pump Available condition : N₂, H₂/N₂mixed Plasma coater Polarized Microscope with digital camera Transmission Electron Microscope in Center for Collaborative Instruments High resolution X-ray Diffraction eq. in Center for Collaborative Instruments